|
Photomask
fabrication
|
 |
FABRICATION OF LPPC-AIDED DOES
The developed technology
of continuous microrelief fabrication (of a 1-100 mm height),
has allowed the manufacture of visible and IR DOEs
|
Photomask
fabrication
|
|
|
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|
Application
of hydrophobic coating
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|
Application
of a LPPC layer
|
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