DOES WITH CONTINUOUS AND BINARY MICRORELIEF DEVELOPED AND FABRICATED AT IPSI RAS
|
DOE type
|
Wave-length,
mm |
Aperture,
mm |
Focal
length,
mm |
Focal
line size
|
Type
of microrelief
|
Fabrication
technique
|
| “Segment”* |
10,6
|
50
|
1200
|
20 mm
|
continuous.
|
LPPC
|
| “Ring”* |
10,6
|
50
|
800
|
20 mm
|
continuous.
|
BCG
|
| “Ring”*** |
1,06
|
35
|
150
|
3õ1
|
binary
|
PCE
|
| “Twin-spots”*** |
1,06
|
35
|
150
|
0õ1,5 mm
|
binary
|
PCE
|
| Rectangular area*** |
1,06
|
35õ35
|
150
|
1õ3 mmv
|
binary
|
PCE
|
| “À” letter** |
1,06
|
5
|
100
|
5 mm
|
binary
|
PL
|
| “p” letter* |
10,6
|
18
|
250
|
10õ10
|
continuous.
|
BCG
|
| Lens array ** |
0,55
|
5õ5, 100õ100
|
3
|
-
|
binary
|
PCE
|
| Satterer (diffraction grating)***** |
0,55
|
1000 line./mm
|
-
|
-
|
binary
|
EBL, PCE
|
Substrate material:
* - copper
** - glass
*** - fused silica
**** - silicon
***** - polymethylacrylate
****** - photoresist coated with Al/ Ag-filmé